{"version":"1.0","provider_name":"Sono-Tek","provider_url":"https:\/\/www.sono-tek.com","author_name":"Sono Tek","author_url":"https:\/\/www.sono-tek.com\/author\/alexkingstoncreative-net\/","title":"Ultrasonic Photoresist Coating vs. Spin Coating: Which Method Delivers Superior Coverage for MEMS and Semiconductor Applications? | Sono-Tek","type":"rich","width":600,"height":338,"html":"<blockquote class=\"wp-embedded-content\" data-secret=\"ivTMYp1XfK\"><a href=\"https:\/\/www.sono-tek.com\/ultrasonic-photoresist-coating-vs-spin-coating-which-method-delivers-superior-coverage-for-mems-and-semiconductor-applications\/\">Ultrasonic Photoresist Coating vs. Spin Coating: Which Method Delivers Superior Coverage for MEMS and Semiconductor Applications?<\/a><\/blockquote><iframe sandbox=\"allow-scripts\" security=\"restricted\" src=\"https:\/\/www.sono-tek.com\/ultrasonic-photoresist-coating-vs-spin-coating-which-method-delivers-superior-coverage-for-mems-and-semiconductor-applications\/embed\/#?secret=ivTMYp1XfK\" width=\"600\" height=\"338\" title=\"&#8220;Ultrasonic Photoresist Coating vs. Spin Coating: Which Method Delivers Superior Coverage for MEMS and Semiconductor Applications?&#8221; &#8212; Sono-Tek\" data-secret=\"ivTMYp1XfK\" frameborder=\"0\" marginwidth=\"0\" marginheight=\"0\" scrolling=\"no\" class=\"wp-embedded-content\"><\/iframe><script type=\"text\/javascript\">\n\/* <![CDATA[ *\/\n\/*! This file is auto-generated *\/\n!function(d,l){\"use strict\";l.querySelector&&d.addEventListener&&\"undefined\"!=typeof URL&&(d.wp=d.wp||{},d.wp.receiveEmbedMessage||(d.wp.receiveEmbedMessage=function(e){var t=e.data;if((t||t.secret||t.message||t.value)&&!\/[^a-zA-Z0-9]\/.test(t.secret)){for(var s,r,n,a=l.querySelectorAll('iframe[data-secret=\"'+t.secret+'\"]'),o=l.querySelectorAll('blockquote[data-secret=\"'+t.secret+'\"]'),c=new RegExp(\"^https?:$\",\"i\"),i=0;i<o.length;i++)o[i].style.display=\"none\";for(i=0;i<a.length;i++)s=a[i],e.source===s.contentWindow&&(s.removeAttribute(\"style\"),\"height\"===t.message?(1e3<(r=parseInt(t.value,10))?r=1e3:~~r<200&&(r=200),s.height=r):\"link\"===t.message&&(r=new URL(s.getAttribute(\"src\")),n=new URL(t.value),c.test(n.protocol))&&n.host===r.host&&l.activeElement===s&&(d.top.location.href=t.value))}},d.addEventListener(\"message\",d.wp.receiveEmbedMessage,!1),l.addEventListener(\"DOMContentLoaded\",function(){for(var e,t,s=l.querySelectorAll(\"iframe.wp-embedded-content\"),r=0;r<s.length;r++)(t=(e=s[r]).getAttribute(\"data-secret\"))||(t=Math.random().toString(36).substring(2,12),e.src+=\"#?secret=\"+t,e.setAttribute(\"data-secret\",t)),e.contentWindow.postMessage({message:\"ready\",secret:t},\"*\")},!1)))}(window,document);\n\/\/# sourceURL=https:\/\/www.sono-tek.com\/wp-includes\/js\/wp-embed.min.js\n\/* ]]> *\/\n<\/script>\n","description":"Understanding the Photoresist Challenge in MEMS and Semiconductors Semiconductor manufacturing is the art of drawing precise patterns onto silicon. These patterns are measured in microns and nanometers, and are repeated billions of times across a wafer no larger than a dinner plate. The process that makes this possible is called photolithography, and it works like&hellip;","thumbnail_url":"https:\/\/www.sono-tek.com\/wp-content\/uploads\/2018\/06\/Ultrasonic-Nozzle-Cross-Section-1.jpg","thumbnail_width":730,"thumbnail_height":586}